Today GLF's 28nm process is still inferior to TSMC's 28nm process
I would really like you to analyze that and provide links to back it up. :whiste:
Gate-first (GloFo) vs. gate-last (TSMC). Gate-last is overall superior.
Im sure you have technical data to provide ???
It's actually very difficult for me to find clear, digestible hard data on the subject.
Well, i guess you dont have Technical Data after all. But you and mrmt made an
absolute statement without even having hard data to back it up.
As you can see I haven't said if 28nm from GloFo is better or worst than TSMCs, I have only asked you people to provide technical data to show us what you were saying was true.
We know the pros and cons of Gate First vs Gate Last, but without having technical data of the actual GloFos/TSMCs process, words like "inferior" and "overall superior" clearly shows bias.
You people could say, because of the cons of Gate First process, Gate Last has better electrical characteristics and i would accept that. But overall superior ?? come on man, you know better than that.
Journalists and informed foundry engineers agree on the subject. Gate first has cost advantages, but has poorer performance, and poorer yields. If gate first were superior, wouldn't GloFo be using it on 20nm? I'd really like you to answer that question.
Again, I have NEVER said that Gate First is "superior". It is words like that that I have a problem with, especially when you(plural) cant provide data, it is not scientific, it is FUD. Only ignorant/bias/PR people talk like that, simple as that.
AMD at the time didnt have much choice but to go for the 32/28nm Gate First process simple because IBM made that decision. The bulk of the R&D was made by IBM, AMD didnt have the money to invest for a new process. Also, AMD at the time only producing wafers for the company itself, they didn't aiming to produce for others.
Now GloFo has money to invest in its own process and they want to compete against TSMC. That change the priorities and decisions made within the company. Both GloFo and Samsung now produce larger amounts of wafers and they want to have a competitive product(Fab Process) against TSMC. Samsung also needs Gate Last for its own products.
They also both GloFo and Samsung will produce low power products unlike IBM that mainly producing its own POWER SKUs. Thus a Gate last process is highly required by both GloFo and Samsung and why both are going to Gate Last from now on.
So it is the combination of the larger volume and the actuall products their customers will produce that make them require the Gate Last process. In that context then the Gate Last process is better than Gate First for both of them. But it was not for IBM because of its low production volume, they did produced 22nm SOI Gate First after all.