Well except people trying to compare density between two processes based on two designs that are operating at upwards of 3x+ clock speed differences for the majority of the area...
We've been over this area before. The comparison is at best invalid and at worst disingenuous. Transistor numbers are not a reliable comparison point without much more data on how they were derived. Nor is comparing density between two products with widely varying frequency optimization points.
So true.
Even further, it does nothing to deconvolute the impact of unknown but surely disparate investments made into the development of the products as well.
A team of 1500 engineers budgeted 4 years and $500M to develop a chip is going to result in a vastly more optimized IC versus the company that challenges a team of 500 engineers to develop a chip in 3 years with a budget of $200M.
The history of IBM's CELL 90nm->65nm->45nm shrink (including why the 45nm didn't, intentionally so, shrink as much as one might have expected based on the 45nm vs. 65nm process specs alone) is perhaps the best annotated and readily available example of recent times.
In the 45 nm CELL processor presentation, IBM was rightfully proud to boast that it was able to dramatically lower power consumption of the processor with minimal design resources – estimated at (low) ten’s of man-years of design effort spent in the successful port of a highly complex modern processor from one process technology to another process technology. The low amount of (re)design effort was no doubt the result of efficient application of effort by the team that contributed the ten’s of man-years of effort. But it is also fundamentally enabled by a highly automated design flow that started with the re-use of the basic floorplan and highly automated shrinks of the basic functional blocks. The cost of the design methodology and low power focus means that the die size scaling was far from linear.
