idontcare, would you take it as a good or bad thing to be going to immersion earlier? I had the impression it was a trick you'd keep in your back pocket for as long as possible and that dry was preferable, even if it required double-exposure (but I'm not a process guy, and I may have been mislead by marketing-disguised-as-research).
Its a matter of what you are willing to take for tradeoffs.
From Intel's perspective in 2004-2005 timeframe when they were looking at committing to a litho platform for 45nm with an eye on the risk of that platform causing delay to a node release timeline of autumn 2007 the immersion-litho integration was simply too immature and too risky.
AMD's decision makers had the luxury of having a whole extra year there for immersion-litho to mature before needing to make a risk-based decision on whether or not to lock-in the use of that technology for their 45nm which wasn't to debut till mid to late 2008.
From a technology vs. cost viewpoint the immersion litho tools are definitely more expensive, if you can get away with using cheaper dry litho tools then all the better.
The question of dual-pattern w/dry-litho vs. single-pattern w/immersion-litho definitely favors the immersion lith provided that the immersion-litho process and equipment have been tweaked and optimized to deliver "entitlement" levels of intrinsic defect-density.
But there is nothing I can write that would do the topic justice because of the inter-play between the tradeoffs in process and integration that are involved with double-pattern vs. immersion-litho.
Depending on your willingness to tolerate more or less misalignment in your design rule specs versus elevating the rework rate versus the actual design critical dimensions that you are trying to hit in the first place you can engineer your process integration and chip design to be more tolerant (at the expense of clockspeed and/or xtor density, etc) such that double-patterning is a cheaper integration approach than immersion-litho. Conversely you could strive to make the most out of immersion-litho, accept higher production costs but in pursuit of higher ASP SKUs so the gross margins work out favorably.
Either strategy has its pros and cons and neither is the wrong way to go unless you happen to make the choice for the wrong reasons (e.g. don't go immersion litho if your critical dimensions are 0.5um
But definitely don't go down the road of viewing Intel's use of double-pattern as a sign of inferiority versus AMD's immersion-litho...the one-year delta between the two in their respective 45nm node development milestones forced decisions there that entirely made sense when overlaid with the development timeline of immersion-litho itself.
That said, if anyone was going to be able to put immersion-litho into production in 2008 it was going to be AMD with their APM. Immersion-litho was right at the hairy-edge of manufacturable in 2008, defect density was just outrageous. Its no wonder that despite having Shanghai released in 2008 AMD waited till early 2009 to get volume ramped up enough to support releasing the higher volume PhenomII consumer parts.
