http://www.chipworks.com/en/technic...is/resources/blog/iedm-monday-was-finfet-day/
We live in amazing times.
We live in amazing times.
It's good to step back once and a while and appreciate that! :thumbsup:http://www.chipworks.com/en/technic...is/resources/blog/iedm-monday-was-finfet-day/
We live in amazing times.![]()
http://www.chipworks.com/en/technic...is/resources/blog/iedm-monday-was-finfet-day/
We live in amazing times.![]()
Intel likes to point out their history – this is the second generation finFET, fourth generation HKMG, and sixth generation strained silicon; will their 10-nm be the third, fifth, and seventh generations?
I’m now inclined to think so, since at an Applied Materials event in the evening, when asked about the delay in the 14 nm launch, Mark Bohr was heard to say “We won’t have similar problems at 10 nm”. Mark does not make such comments lightly, so to me that implies two things – the 10-nm process is pretty well locked down already, and it’s unlikely that there are huge structural changes from the 14-nm generation. Indeed, the aggressive shrink from 22 nm to 14 nm puts them well on the way to the predicted 10-nm feature sizes.
I love it when things in textbooks or academic papers make it to mainstream.![]()
I just wished I had more knowledge about these things, but I guess there's no such thing as a free lunch.
What do you think of the comments (like my predictions/observations) you read about things you probably know more of? Are they fun to read?
Fd-soi! Fd-soi! Fd-soi!!!!!!!!
Where is it?!
I love it when things in textbooks or academic papers make it to mainstream.![]()
Anyone can really answer that.Dave,
Could you please describe what we are seeing in these pix?
According to ITRS 2011, Cu/Airgap integration is the most promising Cu-Extension technology, as airgap is the ultimate low-k material in microelectronics and air has a lowest dielectric constant close to 1.0.
As it turns out, the source of the signal lag is not so much the metal interconnects themselves but rather the insulation between the wires. So the question of the moment is, what can you put between those wires to prevent the signal from leaking?
Vacuum is the best insulator known. Since the 1990s, many chip manufacturers besides IBM, including Infineon Technologies, in Munich, and STMicroelectronics, in Geneva, have experimented with vacuum cavities, and some have even built prototype chips. But two problems have kept the technology from entering production. A chip needs insulation to shield its wires from one another, but it also depends on that insulation for structural support to survive what can be a rough manufacturing process, as well as the often high temperatures on a printed circuit board. Fill the insulation with holes, and the whole chip might collapse. The second problem is making air gaps compatible with standard chip-fabrication techniques. Despite the performance gains that companies have realized on their test chips with air gaps, added equipment and exotic materials have canceled out the performance gain with a money drain.
I did. Unfortunately, your eye sight is worse than a bat.And yet you didn't.
Dave,
Could you please describe what we are seeing in these pix?
Bad dental work? But seriously I have no idea what I'm looking at there...
Dave,
Could you please describe what we are seeing in these pix?
John Chen said:And as for yields, the semiconductor industry is unique in that when you throw 20% of your products away you are happy. We have trained ourselves that 80 to 90% is good. But the cost is so high now, we can’t afford to throw so many chips away.
An interesting quote from the EE Times article:
I think that's quite an understatement when I heard people claiming 20nm yields were in the 50% at the beginning of this year and FinFET now are even lower although they initially wanted to start it this quarter or the next one.
when people quote yields is there a standardized die size they are using for reference?
They'll be behind a paywall. But they're not up yet, regardless.Edit: Any PDFs?
Meanwhile, during a separate panel at IEDM, the focus was on issues at 7nm and beyond. “10nm will be kind of similar to 14nm,” said Karim Arabi, vice president of engineering at Qualcomm. “But at 7nm, we see it as another inflection point.”
In fact, finFET transistors will likely extend to 7nm. But at 7nm or sooner, the industry may need to move towards a new channel material to boost the mobilities. In other words, silicon-based channel materials may simply run out of gas. III-V materials are not ready for 7nm. So, the industry is leaning towards silicon germanium or germanium for the PFET and silicon for the NFET. “Silicon germanium and III-V would be the candidates to consider,” Arabi said. “Silicon germanium is a possibility.”
SE: Some say the III-V materials have been pushed out or delayed. Any thoughts on that?
Bohr: Other companies may choose to push out the adoption of III-V, because all of the problems have not been solved for the 10nm generation. Tool readiness doesn’t seem to be the issue. It’s mostly device physics.
Sounds credible.While Intel is ramping up the 14nm technology, TSMC recently accelerated its 16nm finFET production from the fourth quarter of 2015, to the second quarter of next year.
Sounds credible.
