Gentlemen if I could weigh in here I think I may be able to shed some light on how you all are likely talking past each other.
First up, TuxDave is probably the easiest to explain. He is referring to reticle respins (steppings).
When a design team completes a new mask layer for tapeout its "sent to the factory" which really means its sent to the photomask maker (Intel uses internal, practically everyone else uses Toppan). Once the mask maker has completed the reticle (which includes its own bevy of inspections, verifications, and validations) the reticle goes to the fab where it is physically placed into a scanner's library and used to print wafers. A modern design MPU will have 60-80 photomasks.
Now for the design cycle of creating new steppings there is a certain degree of priority placed on the wafers in the fab to get the silicon turned thru the fab and back in the hands of the design team as they are gated by data at that point and time is money.
I've worked in a fab where we had four levels of priority, highest priority was called a P0 (pronounced pee-zero), next highest was a P1, then P2. Manufacturing, the vast volume of production wafers, in the fab operated at P3, the lowest priority.
Each priority level corresponds to a targeted "days per mask level" metric. P0 priority was targeted to enable 0.5 days per mask level. This was "crisis mode, OMFG we are going to lose a key account with one of our top-ten customers if this hot lot moves any slower than this" type speed in the fab. The lot was hand-carried 24/7 from tool to tool, tools were "held up" in advance to ensure they had nothing in their queue that would prevent the P0 lot from not immediately processing. We had a team of employees hired and dedicated to 24/7 on-site situational monitoring of these P0 lots, and full engineering support, dedicated every night (even as an R&D process development engineer I had to work the night shift for P0 lot coverage for the fab once every 30-45 days for 2 yrs) as well as during the day.
This support infrastructure was above and beyond what it took to run the rest of the fab to get the other 99% of the wafers out of the fab at P3 priority.
And even with all these resources dedicated to hitting 0.5 day/mask-level cycle time the whole fab and operation could not support more than three (3!) P0 lots at any one time.
(P1 lots were targeted at 1 day per mask level, P2 lots were 1.5 days per mask level)
So I know firsthand what it takes to make a lot move thru a fab at that kind of cycle-time. A 9LM device with about 60 masks moving at absolute breakneck speeds (which was only done for respins, quals, and absolute top corporate priority hot lots) will spend no less than 30 days in the fab, not including test and packaging.
You could daisy-chain the tools end-to-end such that the lot goes from one tool right into the next in one long assembly line and for a 60 mask IC the cycle time will not be any faster than 0.5 days per mask. (one caveat there, pm me if you really must have even more details)
So for TuxDave to say the design guys see fab turnaround time of ~6wks on stuff that is gated by getting silicon back from the fab that is quite explainable and at the same time entirely different from saying the average cycle-time for the other 99% of the fab's wip is ~6 weeks. The typical respin at TI was done on P1 priority, about 6 weeks fab turnaround time including packaging. The impact of running P0 type lots thru a fab on the rest of the operation is so severe that it really is restricted for all but the truly crisis situations, not every new chip design or reticle respin warrants 0.5 days/mask cycle-time.
There, done with that, please no more conflating design loop and development R&D cycle-time with production cycle-time metrics.
Now to the situation with Otellini's comment regarding the factories hitting 6weeks...we really have no idea as to what all was factored into his statement, he could have been talking about 65nm chipsets with 6LM and so forth for all we really know.
What we do know is that the likelihood of Otellini speaking about cycle-time metrics and John Fruehe speaking about cycle-time metrics are guaranteed to be two guys speaking about two widely disparately defined cycle-time metrics unless for some odd coincidence the assessment methodologies employed by both individuals (or more likely their direct reports) are referencing the exact same IC or competing IC's.
Is a 6 wk cycle-time possible for a 45nm 9LM device with double-patterning steps (mask adders) and replacement gate (mask adders) integration? Sure it is, 4 weeks is possible. A P1 level priority (TI nomenclature, not Intel's) I'd expect the lot to take 6 weeks to get through the fab.
But can an entire fab operate at P1 level of pace (1 day per mask level)? Phenomenal if true, which is what I left it at.
Is 13 wks a reasonable average production lot cycle-time for a 45nm 10LM SOI immersion-litho and standard gate integration? Yes, absolutely. Outside of the solitary quote from Otellini I know of no other fab or IDM that operates any faster than that (right around 2 days per mask level) for their bulk production volume in the fab.
(and by the way, casting cycle-time metrics as "days per mask level" is an industry standard, kind of like how the airline industry uses "seat-miles" as a common metric for benchmarking each other...so when I see Otellini making woefully unqualified cycle-time comments and not even using the standard cycle-time metric lingo it really raises a red-flag to me that this guy just might not be talking about what we all think he is talking about, same with Fruehe and his 13wk comment, unqualified as to device, technology, and mask levels so it is a worthless data point for comparing to other IDM's)