Using that video and assuming detailed knowledge, compares to getting a degree by reading Scientific American.
Those SEM shots from the anandtech article?
Thanks for that. Forgot those exist.
Look at the following (Sub-micron CoW interconnect demonstrated). The boundaries clearly show a very slight (nm ?) penetration into the next level. Notice the gentle saucer shaped deformation? That's material displacement from the center due to pressure by the slimmer shaft. You can even just see the slim pillars penetrating slightly into the conical ones at the ends.
Definitely the Cu pillars are standing a few nm above the silicon plane before bonding.
I'm more convinced now that some sort of pressure welding (+ vacuum & heat ?) is used to fuse the Cu pillars. Clears up a big part of the question I had. How is this
actually being manufactured?
The other related topic is the silicon blanks.
Seeing that the cache die are bonding the Cu interconnects by allowing a given pillar to slightly penetrate it's mating pillar, we can reasonably assume that the silicon is NOT vacuum bonded just by the common assumption of being perfectly flat (

) and being placed next to each other.
Those silicon blanks over the cores must be using a thermal glue/paste for attachment. This might have a negative effect on heat transfer to a larger degree that might have been thought.
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