Originally posted by: Babbles
Originally posted by: Tiamat
Originally posted by: Eli
Originally posted by: Tiamat
Yup, IPA strikes a great compromise for its cleaning strength while leaving no impurities on the surface. Acetone is a stronger cleaner, but leaves impurities on the surface of what was cleaned.
An experiment that I did during undergrad that I thought was cool was to freeze IPA in LN2. As the IPA approaches it's freezing point in LN2, the mixture turns into a very viscous liquid that is as thick as honey/molasses.
I think you're mistaken. Acetone should evaporate clean away, as long as the acetone is pure in the first place.
Xylene leaves impurities though.
I am not mistaken, and Xylene/Toluene are stronger solvents and do leave impurities. My experience is with silicon wafer degreasing and cleaning in preparation for ultra high vacuum (10E-11 torr) environments.
Generally for mild degreasing, it is good enough to start with acetone, then IPA, then EtOH, then methanol, then degassed DI 18Mohm water. This process allows for better than PPB surface impurity count which is necessary for ultra-high vacuum to be obtained in a timely fashion (hours instead of days).
In the presence of high flowing dry nitrogen, it is possible that acetone alone may not leave significant residue, however, for all intents and purposes, the multi-step graduated cleaning method is generally accepted by all surface scientists and surface chemists.
Looks like silverpig does exactly as I mentioned! I only had to use TCE once, and that was done with the silicon as received from the vender (and following RCA clean). Any other relatively clean manipulation of the substrate only required acetone as the lead solvent.
Stronger solvent is all relative. Xylenes and Toluene are aromatic and non-polar. As such they would be better solvents for cleaning aliphatic and aromatic messes . . . typical fuels and/or oils. Things like IPA or acetone are slightly polar and as such are better solvents for more polar compounds.
Of course it is all relative. I mentioned in my previous post response that my experience is with the degreasing of silicon wafers in preparation for UHV environments.
