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Originally posted by: 91TTZ
Originally posted by: 0
With the hafnium material serving as the gate, Intel will then replace the polysilicon electrode layer with a metal electrode, the exact alloy used here also being kept secret. As a result, transistors for 45 nm semiconductors starting with Intel's Penryn family will be fabricated at half the size of those used in today's 65 nm Core 2 processors. At the same time, transistor switching power can be reduced by as much as 30%, while still obtaining a performance improvement of as much as 20%.
Aren't gains like that usually the result of the die shrink due to the new process, and not a result of the material being used?
If Intel switched to 45nm from 65nm while still using the same transistor technology, that would have also resulted in the dies being much smaller, using less power, and being faster.
This new technology in the article is bound to do something, but it's hard to tell what it exactly did for performance since it also included a shrinking of the process.
With out the change to the gate when shrinking the transistor size the gate currrent would have increased.