silverpig
Lifer
- Jul 29, 2001
 
- 27,703
 
- 12
 
- 81
 
I tell you, lithography + evaporation. I put 70 nm wide Cr and Au traces (got up to a few microns wide), that were about 30 nm thick (I could have gone for a micron easily), on 4 um of polyimide on a phosphor bronze substrate. Depending on the width of your traces you can just find a good photoplotting website with an insanely high dpi printer. Just send them a vector file of your pattern, they'll print it on a transparency for you and send it to you for something like $10.
Then, head on over to the mems exchange and you can probably get polyimide put on a silicon wafer, then photoresist, have them do the lithography and Al deposition. You'll have to figure out how to get the polyimide off the Silicon, but that may be easy if you just put a layer of photoresist underneath the polyimide. When they do the liftoff process after evaporating the Al to remove the photoresist mask, the resist underneath the polyimide will also dissolve, freeing your film. This film will be really flimsy though and it will be floating in liquid so I really don't know what you'll be doing with it or how you'll proceed from there.
			
			Then, head on over to the mems exchange and you can probably get polyimide put on a silicon wafer, then photoresist, have them do the lithography and Al deposition. You'll have to figure out how to get the polyimide off the Silicon, but that may be easy if you just put a layer of photoresist underneath the polyimide. When they do the liftoff process after evaporating the Al to remove the photoresist mask, the resist underneath the polyimide will also dissolve, freeing your film. This film will be really flimsy though and it will be floating in liquid so I really don't know what you'll be doing with it or how you'll proceed from there.
				
		
			