The MirrorBit architecture uses a radical new design and process technology to double the density without any performance penalty. In the MirrorBit cell, the basic transistor itself is very different from conventional transistors. Instead of the classical asymmetric transistor with a distinctly doped source and drain, the MirrorBit cell uses a symmetric transistor with similar source and drain. The charge storage element has been modified to allow electrons to be stored on either side of the cell. Once electrons are placed into one side of the storage element, say on the left side of the cell, they remain trapped on that side. Consequently, read, program, and erase operations are performed at full speed and power regarless of whether one is using the left bit or right bit. As a result, the basic memory cell behaves as though it were two independent conventional memory cells. This architecture therefore offers twice the density of standard Flash without sacrificing performance or reliability.
Originally posted by: rjain
If it's patented, then you'll get all the info needed to recreate the system from the patent.
Originally posted by: rjain
It's probably that the conductivity is MORE affected by what's nearby, as that's what's closer... 🙂
The trick was probably in engineering it so that the difference in effect was enough to be reproducibly measurable.
Originally posted by: rjain
Hmm, a silicon channel isn't exactly comparable to a water pipe, as there's nothing that much like fluid flow going on in it. Turbulence can cause very complex flow patterns in a water pipe.
Originally posted by: rjain
The reason you can't tell which end is impeding more is because of the voritces created by the flow...
Maybe I didn't understand what you were trying to show. 😛
Originally posted by: rjain
After looking at the design in more detail, it looks like the two parts aren't nearer or farther from the source and drain, but nearer or farther from what is currently acting as the source or drain. The current passes directly through both of the parts of the gate in the same way, one after the other. Is that correct?
...reading said first bit in a direction opposite said first forward direction by applying read voltages to said second region and said gate and grounding said first region, and subsequently determining if said first binary value is stored by sensing a first current between said second and said first regions or if said second binary value is stored by sensing a second current between said second and said first regions, said second current being higher than said first current;
reading said second bit in a direction opposite said second forward direction by applying read voltages to said first region and said gate and grounding said second region, and subsequently determining if said third binary value is stored by sensing a third current between said first and said second regions or if said fourth binary value is stored by sensing a fourth current between said first and said second regions, said fourth current being higher than said third current;