http://www.tomshardware.com/news/ib...smc-samsung-semiconductor-new-york,13561.html
although enhanced conventional lithography can produce commercial wafer/dice yields at 12nm, there is compelling need to transit to x-ray lithography in foundries --- this study/development center will fleshout commercial yield limits, applied to 450mm wafer production, of fully enhanced conventional lithography or will develop protocols/practices of initial x-ray lithography applied to large scale wafer fab having high yields
3.6B is about right & the heavy hitters are jointly developing this tech --- I ask "Where are PRC reps?"
past time if Moore's Law is to remain applicable...
although enhanced conventional lithography can produce commercial wafer/dice yields at 12nm, there is compelling need to transit to x-ray lithography in foundries --- this study/development center will fleshout commercial yield limits, applied to 450mm wafer production, of fully enhanced conventional lithography or will develop protocols/practices of initial x-ray lithography applied to large scale wafer fab having high yields
3.6B is about right & the heavy hitters are jointly developing this tech --- I ask "Where are PRC reps?"
past time if Moore's Law is to remain applicable...
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