True, but at least people had ideas about how it might be done back then.
As far as I know, maybe with the exception for immersion lithography, no one has been able to come up with a realistic idea for a 45 nm process (again, we are talking about commercial production, there are plenty of methods which might work for small circuits or prototypes).
In reseach labs the "limit" for photolithography is around 150 nm, anything below that you use an e-beam (not that it matters much, you need to use an e-beam to make the mask anyway). 90 and 65 nm photolithograhy is VERY specialized (how many places are there that can manage 65 nm?)